Atomistic Simulation of Metallic Nanowires

Kristi Harris, University of Maryland, Baltimore County

Photo of Kristi Harris

The primary cause of integrated circuit failure is the effect of electromigration on the metallic wires that connect circuit components. As interconnect dimensions shrink further into the nanoscale, it is increasingly important to develop a physical understanding of electromigration failure mechanisms on an atomistic scale. In our research, we are investigating the electromigration effect on copper and aluminum nanowires through atomistic modeling and simulation. We implement a model of the electromigration effect as a biased diffusion application that runs on SPPARKS (Stochastic Parallel PARticle Kinetic Simulator), an open source kinetic Monte Carlo code developed at Sandia National Lab. Selected simulation results will be presented.

Abstract Author(s): Kristi Harris